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Mo, 09:30–10:15 |
H1 |
HL I: HV I |
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Mo, 14:30–15:15 |
H1 |
HL II: HV II |
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Di, 09:30–10:15 |
H1 |
HL III: HV III |
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Di, 14:30–15:15 |
H1 |
HL IV: HV IV |
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Di, 15:15–16:00 |
H1 |
HL V: HV V |
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Mi, 14:30–15:00 |
H2 |
HL VI: HV VI |
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Mi, 15:00–15:30 |
H2 |
HL VII: HV VII |
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Mi, 15:30–16:00 |
H2 |
HL VIII: HV VIII |
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Mi, 16:00–16:30 |
H2 |
HL IX: HV IX |
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Mi, 16:30–17:00 |
H2 |
HL X: HV X |
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Do, 09:30–10:15 |
H1 |
HL XI: HV XI |
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Do, 14:30–15:15 |
H1 |
HL XII: HV XII |
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Fr, 09:30–10:15 |
H1 |
HL XIII: HV XIII |
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Fr, 10:15–11:00 |
H1 |
HL XIV: HV XIV |
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Mo, 10:30–13:00 |
H1 |
HL 2: Störstellen I |
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Mo, 10:30–13:00 |
H2 |
HL 3: Theorie I |
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Mo, 10:30–13:00 |
H3 |
HL 4: Diamant |
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Mo, 10:30–12:45 |
H4 |
HL 5: Raman/Nichtlineare Optik |
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Mo, 15:30–18:00 |
H1 |
HL 7: Störstellen II |
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Mo, 15:30–19:30 |
H2 |
HL 8: Theorie II |
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Mo, 15:30–19:30 |
H3 |
HL 9: SiC |
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Mo, 15:30–19:30 |
H4 |
HL 10: Epitaxie |
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Mo, 15:30–18:30 |
Z |
HL 11: Poster I |
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Di, 10:30–12:30 |
H1 |
HL 13: Heterostrukturen |
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Di, 10:30–12:30 |
H2 |
HL 14: Si/Ge I |
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Di, 10:30–12:30 |
H3 |
HL 15: STM |
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Di, 10:30–12:30 |
H4 |
HL 16: Ultrakurzzeitdynamik |
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Di, 16:00–19:30 |
H1 |
HL 18: II/VI-Halbleiter |
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Di, 16:00–19:00 |
H2 |
HL 19: Si/Ge II |
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Di, 16:00–19:30 |
H3 |
HL 20: HL-Laser |
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Di, 16:00–19:15 |
H4 |
HL 21: Amorphe Halbleiter |
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Di, 15:30–18:30 |
Z |
HL 22: Poster II |
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Do, 10:15–12:15 |
H1 |
HL 25: GaN I |
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Do, 10:15–12:15 |
H2 |
HL 26: Grenzflächen/Oberflächen |
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Do, 10:15–12:15 |
H3 |
HL 27: Quantendots I |
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Do, 10:30–12:30 |
H4 |
HL 28: Gitterdynamik |
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Do, 15:30–19:30 |
H1 |
HL 30: GaN II |
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Do, 15:30–19:30 |
H4 |
HL 31: Transport in Halbleitern |
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Do, 15:30–19:30 |
H2 |
HL 32: Quantendots II |
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Do, 15:30–19:45 |
H3 |
HL 33: Photovoltaik |
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Fr, 11:00–13:15 |
H4 |
HL 36: Poröses Si |
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Fr, 11:00–13:30 |
H3 |
HL 37: Devices (elektrisch) |
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Fr, 11:00–13:30 |
H2 |
HL 38: Implantation |
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Fr, 11:00–13:30 |
H1 |
HL 39: III/V |
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Fr, 11:00–14:00 |
Z |
HL 40: Poster III |
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