Münster 1997 – wissenschaftliches Programm

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HL: Halbleiterphysik

HL 11: Poster I

HL 11.12: Poster

Montag, 17. März 1997, 15:30–18:30, Z

Thermochemical Polishing of Polycrystalline CVD Diamond Films — •Alexander Zaitsev¹, Gabriele Kosaca¹, Alexander Melnikov², Valeri Varichenko², Reinhart Job¹, and Wolfgang Fahrner¹ — ¹FernUniversität Hagen, Bauelemente der Elektrotechnik, Postfach 940, 58084 Hagen — ²Belarussian State University, 220080, Minsk, Belarus

A set-up for thermochemical polishing of CVD diamond films has been developed. The removal rate of the polishing and the roughness versus temperature, plate velocity and pressure has been measured. The general conclusion is: the higher the temperature the higher the removal rate and roughness. The highest removal rate obtained on flat samples at 1020^∘C is less than 10 nm. The sharpness of edges between two polished surfaces is about 20 nm. The perspectives of the thermochemical method for the polishing of diamond will be discussed.