Münster 1997 – wissenschaftliches Programm
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O: Oberflächenphysik
O 28: Metall/Metall-Epitaxie II
O 28.4: Vortrag
Donnerstag, 20. März 1997, 12:00–12:15, S 10
Modifications of the electronic structure of Ni/Cu(100) films as a function of thickness — •P. Srivastava, N. Haack, H. Wende, L. Lemke, R. Chauvistré, A. Ney, and K. Baberschke — Inst. für Experimentalphysik, FU-Berlin, Arnimallee 14, D–14195 Berlin Dahlem
Thin Ni films are known to grow pseudomorphically in a layer–by–layer mode on Cu(100) having face centered tetragonal structure instead of cubic. A number of studies have been reported to understand the magnetic properties of the present system [1,2], very few have studied changes in electronic structure as a function of Ni thickness on Cu(100) [3]. Such studies are important to resolve some of the questions which have direct implication in an estimation of spin and orbital momentum contributions to the local magnetic moment. To get a direct insight into the in– and out–of–plane Ni 3d,4sp density of unoccupied states, we report angle dependent Near Edge X–ray Absorption Fine Structure (NEXAFS) measurements of Ni films (0.5 - 16 ML) grown on Cu(100) at Ni L3,2–edges carried out at BESSY. Changes in the intensity and shape of white line and satellite structure as a function of Ni thickness have been observed and will be discussed. This work was supported by DFG SFB290, BMBF (Nr. 05625 KEA 4) and the AvH Foundation.
[1] K. Baberschke, Appl. Phys. A 62(1996)417
[2] F. May et al., Phys. Rev. B 53(1996)1076
[3] B. Hernnäs et al., Doctorate thesis of H. Tillborg, Uppsala University (1993)