Münster 1997 – wissenschaftliches Programm

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O: Oberflächenphysik

O 6: POSTER I

O 6.35: Poster

Montag, 17. März 1997, 14:15–15:45, AULA

The Chemisorption of Polyimide Precursors and Related Molecules on Si(100)-2x1 — •T. T. Alkunshalie, Th. Bitzer, and N.V. Richardson — IRC in Surface Science, The University of Liverpool, P. O. Box 147, L69 3BX, U. K.

Due to possible applications, considerable work has been carried out to develop the reactive growth of polyimide films on metal surfaces. In this study, we report on the adsorption of the polyimide precursors pyromellitic dianhydride (PMDA) and phenylene diamine (PDA) on Si(100)-2x1. For the dosage of PMDA on Si(100)-2x1, a specifically designed doser was used which will be presented.

LEED images of Si(100)-2x1 exposed to the precursors indicate that the Si substrate remains reconstructed upon adsorption. The vibrational analysis with High Resolution Electron Energy Loss Spectroscopy (HREELS) of the conditioned surfaces shows that Si-O-C and Si-N-C linkages are formed upon the chemisorption of PMDA and PDA, respectively. The chemisorption process and the coordination of the chemisorbed species will be discussed. We also present first results on the reactive growth of a polyimide film on Si(100)-2x1.