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Regensburg 1998 – scientific programme

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DS: Dünne Schichten

DS 24: Postersitzung

DS 24.29: Poster

Thursday, March 26, 1998, 15:00–19:00, PF A

Phonon Density of States in Amorphous and Crystalline Tb-Fe Thin Films Measured by Inelastic Nuclear Resonant Scattering — •W. Keune3, W. Sturhahn1, R. Roehlsberger2, E.E. Alp1, and T. Ruckert31Advanced Photon Source, Argonne National Lab., Argonne, IL 60439, USA — 2FB Physik, Univ. Rostock, D-18051 Rostock, Germany — 3Lab. f. Angew. Physik, Univ. Duisburg, D-47048 Duisburg, Germany

The recently reported new method [1,2] of inelastic nuclear scattering of X-rays from the 14.4136 keV nuclear resonance of 57Fe was employed to measure directly the Fe-projected phonon density of states (DOS) in UHV-deposited 17.5 nm or 80 nm thick amorphous Tb1−xFex alloy films and in a 80 nm TbFe2(110) film (Laves phase) epitaxially grown on Nb(110)/Al2O3(1120). Distinct differences in the DOS were observed for the Laves phase and the amorphous alloy of the same composition. Characteristic quantities (recoilless fraction, kinetic energy per atom, average phonon energy and vibrational entropy) of the Fe-vibrational atomic motion were derived. The method is sensitive for measuring the phonon DOS in thin films and at isotopically enriched interfaces.
M. Seto et. al., Phys. Rev. Lett. 74, 3828 (1995)
W. Sturhahn et. al., Phys. Rev. Lett. 74, 3832 (1995)

Supported in part by DFG (SFB 166) and Volkswagen-Stiftung.

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