Leipzig 1999 – wissenschaftliches Programm
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PO: Polymerphysik
PO 6: Poster: Dünne Filme und Grenzfl
ächen
PO 6.12: Poster
Dienstag, 2. März 1999, 14:00–16:00, Foyer
Dewetting kinetics of thin polystyrene films on a polyamide layer — •C. Renger1, P. M"uller-Buschbaum1, M. Stamm1, and G. Hinrichsen2 — 1Max-Planck-Institut f"ur Polymerforschung, Ackermannweg 10, D-55128 Mainz — 2TU- Berlin, Institut f"ur Nichtmetallische Werkstoffe, Englische Str. 20, D-10587 Berlin
Thin polymer films may be prepared on non wettable silicon surfaces by spin coating. Beside the frequently examined dewetting of one single layer on top of a solid substrate, we investigate the dewetting of a polymer bilayer. Polyamide 6,6 (PA) (Mw=28900 g/mol) spin-coated on a silicon substrate was used as a sublayer. On top of this layer polystyrene (PS) films of different thicknesses (10nm, 20nm, 40nm, 80nm, 150nm) and different molecular weights (Mw=2160g/mol, 8685g/mol, 28900g/mol) were prepared. The films were annealed at T=119∘C, T=154,4∘C and T=195∘C, well above the glass transition temperature of PS or/and PA. The dewetting process was observed in-situ by time resolved reflected light microscopy (LM) or ex-situ by LM and phase modulated interference microscopy. The determination of the area of dewetted PA surface with time leads to a characteristic behaviour of hole growth, which charcateristic is modelled. Further, a styrene maleic anhydride random copolymer was used to retard the dewetting of polystyrene (Mw=2160 g/mol). The influence of the blend compositions on this retardation was examined.