Leipzig 1999 – wissenschaftliches Programm
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PO: Polymerphysik
PO 6: Poster: Dünne Filme und Grenzfl
ächen
PO 6.13: Poster
Dienstag, 2. März 1999, 14:00–16:00, Foyer
Surface structures in thin blend films of PS and PnBMA — •T. Schmitt1, M. Stamm1, P. M"uller-Buschbaum1, S. Affrossman2, S.A. O’Neill2, G. Sch"onhense3, and O. Schmidt3 — 1Max-Planck-Institut f"ur Polymerforschung, Ackermannweg 10, D-55128 Mainz (Germany) — 2Department of Pure and Applied Chemsitry, University of Strathclyde, Cathedral Street, Glasgow G1 1XL, UK — 3Institut f"ur Physik, Staudinger Weg 7, Johannes Gutenberg-Universit"at Mainz, D-55099 Mainz (Germany)
The surface structure in thin polymer blend films of polystyrene (PS) and poly-n-butyl-methacrylate (PnBMA) was examined with Photoemission Electron Microscopy (PEEM), X-ray Photoelectron Spectroscopy (XPS) and optical microscopy. The films were prepared by spin casting from a toluene solution of the polymer mixture on to silicon wafers retaining the native oxide. Depending on blend composition smooth films with and without holes or films with elevated surface features (ribbons or islands) can be produced. With PEEM it is possible to map the lateral distribution of the two polymers by employing the characteristic Near Edge X-ray Absorption Fine Structure (NEXAFS) spectra of the polymers. XPS measurements reveal that PnBMA segregates to the air interface. With optical microscopy an in-situ examination of the free film boundary during annealing at a temerature above the glass transition temperature of both polymers can be performed and the interplay between phase separation and dewetting during annealing can be studied.