Münster 1999 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 10: Schichtabscheidung
DS 10.3: Fachvortrag
Montag, 22. März 1999, 16:00–16:15, H 55
Influence of different substrates on the texture of thin Co films — •Dilip Sarkar — TU Chemnitz, Inst. für Physik, 09107 Chemnitz
Thin film of Co was deposited at room temperature on Si(100), Si(111), SiO2/Si(100) and thin Ti, Zr or Hf coated Si(100) substrates using MBE as well as magnetron sputtering. These films were characterised by X-ray Diffraction (XRD) and Cross-sectional Transmission Electron Microscopy (XTEM). No characteristic Co peak was observed by XRD when the film was directly deposited on Si(100), Si(111) and SiO2/Si(100) substrates but the existence of Co film was confirmed by X-Ray reflectivity and XTEM study. These films are amorphous in X-Ray diffraction but poly-crystalline in electron diffraction study. Highly textured Co film was observed on thin Ti, Zr and Hf coated Si(100) substrates. Texturing of the Co film will be discussed on the basis of the surface energy and lattice misfit of Co with different substrates.