Bonn 2000 – wissenschaftliches Programm
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P: Plasmaphysik
P 16: Plasmadiagnostik (Poster)
P 16.13: Poster
Mittwoch, 5. April 2000, 10:30–13:00, Aula
Tunable diode laser diagnostics studies of RF plasmas containing hexamethyldisiloxane. — •M. Osiac2, G. Revalde1, K. Li3, J. Röpcke2 und J. Meichsner3 — 1Institut für Atomphysik und Spektroskopie, Universität Lettland, Riga — 2Institut für Niedertemperatur-Plasmaphysik, 17489 Greifswald — 3Institut für Physik, Universität Greifswald, 17487 Greifswald
The decomposition of hexamethyldisiloxane (HMDSO) in a variety of plasma-enhanced chemical vapor deposition (PECVD) processes is of interest because it is frequently used to deposit thin films. The monitoring of transient or stable plasma reaction products, in particular, the measurement of their ground state concentrations, is the key to improve understanding of the plasma chemistry. The contribution will describe recent studies of HMDSO fragmentation using infrared tunable diode laser absorption spectroscopy (TDLAS) in a low pressure, asymmetric RF discharge (f =13.56 MHz). The methyl radical was one of the main species of interest. Its concentration was found of about 1013 molecules cm−3. In addition the molecular concentrations of CH4, C2H2, C2H4 and C2H6 have been measured in pure HMDSO discharges and in admixtures with Ar and O2, while discharge power, total gas pressure and gas flow rate were varied. The results were completed by mass spectrometry (see poster K. Li et al.).