Regensburg 2000 – scientific programme

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DS: Dünne Schichten

DS 33: Schichtcharakterisierung II

DS 33.6: Fachvortrag

Thursday, March 30, 2000, 10:45–11:00, H32

Volatile surfactant assisted chemical vapor deposition of the complex oxide films — •Andrey Kaul¹, Alexander Molodyk¹, Oleg Gorbenko¹, Igor Korsakov¹, Mikhail Novozhilov¹, Sergey Samoylenkov¹, Georg Wahl², and Ulrich Krause² — ¹Chemistry Dpt., Moscow State University, 119899 Moscow, Russia — ²IOPW, TU Braunschweig, Bienroder Weg 53, 38108 Braunschweig

The conventional chemical vapor deposition of the complex oxides at the high deposition rate often suffers from the difficulty of the phase formation, competition of the different film orientations and kinetic roughening of the film surface. The new approach is developed to overcome the problems. The deposition process is carried out in the presence of the undersaturated vapor of the volatile metal oxide with low melting point like PbO or Bi₂O₃. The oxide vapor is adsorbed on the surface of the growing film as a quasiliquid layer providing a drastic increase of the surface diffusion. The crystalline quality of practically important thin film materials including BaTiO₃, LaAlO₃, MgAl₂O₄ was found to be enhanced by the volatile surfactant (X-ray rocking curve measurements, HREM, RBS). Simultaneously, the surface roughness was significantly decreases in the presence of the volatile metal oxides (AFM data). On the other hand, the volatile oxides were used for an automatic adjustment of the stoichiometry in PbTiO₃, (Pb,Cu)₂Ba₂YCu₂O_x and La_1−xPb_xMnO₃ films of excellent surface smoothness.