Regensburg 2000 – wissenschaftliches Programm
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HL: Halbleiterphysik
HL 38: Poster III: Transporteigenschaften (1-14), Optische Eigenschaften (15-31), Grenz-/Oberfl
ächen (32-44), Heterostrukturen (45-57), Bauelemente (58-67), Gitterdynamik (68-69), Diamant (70), Raster-Tunnel-Mikroskopie (71)
HL 38.60: Poster
Donnerstag, 30. März 2000, 14:00–19:00, B
Nanomechanical Resonators operating in the nonlinear regime — •A. Kraus, A. Erbe, and R.H. Blick — Center for NanoScience, LMU Munich, Geschwister-Scholl-Platz 1, 80539 Munich
Nanomechanical resonators, machined out of Silicon-on-Insulator wafers,
are operated in the nonlinear regime to investigate higher order
mechanical mixing at radio frequencies. This is of great importance for
signal processing and nonlinear dynamics on the nanometer scale.
The response of the resonators at hysteresis is studied and compared to
nth-order order perturbation theory. In addition we determined the
quenching of the mechanical resonance
by phonon excitation in liquid 4He
and in a dilution of 3He/4He at 30 mK.