Regensburg 2000 – wissenschaftliches Programm
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O: Oberflächenphysik
O 11: Postersession (Eröffnung)
O 11.88: Poster
Montag, 27. März 2000, 19:00–22:00, Bereich C
Point Light Sources for Near-Field Optical Microscopy — •J. Martin1, L. Bischoff2, J. Teichert2, B. Koehler3, and R. Wannemacher1 — 1Institut fuer Physik, Universitaet Chemnitz, D-09107 Chemnitz — 2Insitut fuer Ionenstrahlphysik und Materialforschung, D-01314 Dresden — 3Fraunhofer-Institut fuer zerstoerungsfreie Werkstoffpruefung, D-01326 Dresden
Highly localised color center distributions have been generated by focussed ion-beam irradiation on diamond, alkali halide and earth alkali halide surfaces. The suitability of these centers as point light sources in near-field optical microscopy /1/ has been characterised. Whereas neutral and negatively charged NV-centers in diamond prove to be highly photostable and can be produced with lateral resolution well below 180 nm /2/, F2 and F3+ centers in LiF undergo rapid photophysical conversion processes, and the spatial resolution appears to be limited by diffusion of vacancies to about 1.5 mm. The relative concentrations of various color centers are determined by spectrally resolved confocal optical microscopy as a function of irradiation dose and, in the case of alkali halides, of the time under optical illumination. Local generation of color centers on diamond tips is reported.
/1/ R. Wannemacher, German patent application no. 19705308.4, february 1997
/2/ J. Martin, L. Bischoff, J. Teichert, B. Koehler, R. Wannemacher, Appl. Phys. Lett. 75, 3096 (1999)