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VA: Vakuumphysik und Vakuumtechnik

VA 6: Ausgasung und Oberfl
ächen

VA 6.3: Vortrag

Dienstag, 28. März 2000, 15:40–16:00, H\"orsaal 47

Investigation of an in-situ cleaning method for UHV surfaces using free radicals — •Georg Vorlaufer¹, Noël Hilleret¹, and Herbert Störi² — ¹CERN, LHC Division, 1211 Geneva, Switzerland — ²TU Wien, Institut für Allgemeine Physik, 1040 Wien, Austria

The cleaning of vacuum chamber walls is a very important step to obtain UHV conditions in a vacuum system. Well established methods like in-situ bake out or glow discharge cleaning exist, but are sometimes difficult to carry out in large systems. In order to evaluate alternative solutions, the effectiveness of free radicals for the in-situ cleaning of UHV systems is being studied.

The radicals are produced by an industrial type microwave plasma generator and pumped through a vacuum chamber where they can recombine on the surface and form volatile reaction products with surface contaminants.

First experiments performed in order to quantify the effectiveness of this cleaning procedure will be described and first experimental results will be presented.