Berlin 2001 – wissenschaftliches Programm
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P: Plasmaphysik
P 2: Plasma Technology, Diagnostics I
P 2.7: Vortrag
Montag, 2. April 2001, 18:10–18:25, 2032
EUV emission from Kr and Xe capillary discharge plasmas — •L. Juschkin1, S. Zacharov2, S. Chuvatin2, S. Ellwi1, and H.-J. Kunze1 — 1Institut für Experimentalphysik V, Ruhr-Universität Bochum, Germany — 2Ecole Polytechnique, Palaiseau, France
Krypton and xenon plasmas are very intensive emitters in the spectral range of 10 to 15 nm, which is relevant for a number of applications (for example microlithography). We present investigations of the EUV emission from a slow capillary discharge [1] with Kr and Xe fillings. The emission of Kr ions (KrVIII to KrXI) within the range of 7 to 15 nm consists of three bands of lines of about 1 nm width with maxima at 11.6 nm, 10.3 nm and 8.6 nm. Xenon emission bands of about 1.5 nm width have their maxima at 13.6 nm and 11.5 nm (XeIX to XeXII). The radiation duration in this spectral range is ∼ 150 ns for both elements.
At the optimum conditions the Kr emission at 10.3 nm is 2−3 times more intense than the Xe emission at 13.6 nm. This is due to the lower electron temperature in the Xe discharges (∼ 17−20 eV) compared with the Kr discharges (∼ 25−30 eV) at the same discharge energy, which can be explained by the larger energy consumption for ionization and radiation losses in the xenon plasmas.
Numeric modellings of the dynamics and emission of the capillary discharge plasma are presented and compared with the experimental results. This enables the future use of the codes as additional instrument for plasma diagnostic.
[1] Juschkin L, Hildebrand A, and Kunze H-J. Plasma Sources Sci. Technol., 8, 370, (1999).