Berlin 2001 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
P: Plasmaphysik
P 8: Magnetic Confinement and Plasma Technology (Poster Session)
P 8.21: Poster
Montag, 2. April 2001, 12:30–15:00, AT2
BSCCO ceramics sputtering in hollow cathode discharge — •Valentin Mihailov, Renna Djulgerova, Vesselina Gencheva, Angelina Ivanova, and Ginka Mihova — Institute of Solid State Physics - Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee blvd., 1784 Sofia, Bulgaria
The use of the hollow cathode discharge for technological purposes, namely for deposition and etching, recently turns out to be a perspective application of this spectral and plasma source. In this connection, the study of entering of different elements, especially from many component materials, into the hollow cathode plasma is a important task. The purpose of the present work is to study the sputtering of the different elements from Bi1.8 Pb0.4 Sr2 Ca2.2 Cu3.2 O10+y ceramics in the hollow cathode glow discharge plasma and correlation of sample composition with plasma composition. The used hollow cathode design is suitable for probe measurement of the quantity of sputtered substance put in the hollow cathode as a powder. A probe having the plasma potential is axially inserted into the hollow cathode plasma and the sputtered substance condenses on it. The mass of the deposits of different elements from BSCCO ceramics under studying is measured by quantitative spectral analyses performed by ICP-OES (27 MHz ICP Jobin-Ivon system equipped with 1m Czerny-Turnur monochromator). The quantity relations of the sputtered components into the hollow cathode plasma are studied as a function of discharge conditions. The results obtained by this study are important for hollow cathode discharge applications in fabrication of high temperature superconductor layers.