Berlin 2001 – scientific programme

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Q: Quantenoptik

Q 1: Poster: Atom Optics

Q 1.5: Poster

Monday, April 2, 2001, 12:30–15:00, AT2

Holographic Light Masks for Atom Lithography — •Stephan Tandler, Mario Mützel, Habib Mérimèche, and Dieter Meschede — Institute für Applied Physics, University of Bonn, Wegelerstraße 8, 53115 Bonn

In Atom Lithography deposition of an atomic beam on a given substrate can be controlled by a standing wave light field. Thus the lateral intensity distribution of the light field is transferred to the substrate with nanometer scale.

We theoretically investigate the possibility of designing 2D light masks utilizing a holographic mirror. With a single holographic mirror superposition of 1000 or more laser beams can be achieved leading to generation of sophisticated light masks. We also study the feasibility of generating arbitrary masks.

Experimentally we use a lithiumniobate crystal in which a hologram is inscribed via lightinduced refractive index changes. This hologram diffracts one incident laser beam into two outgoing beams. These three beams interfere with each other forming the light mask. The resulting structure consists of periodically interrupted parallel stripes.

We also investigate the dependence of the intensity of the reflected laser beams on certain parameters, namely the temperature of the crystal, the angle of incidence of the incoming laser beam and its polarization. We show the results of these experiments.