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Q: Quantenoptik

Q 21: Poster: Optical Applications

Q 21.8: Poster

Donnerstag, 5. April 2001, 12:30–15:00, AT2

Spectral Characterization of F₂-Laser-Radiation with a Resolution of 10⁶ — •Frank Becker and Klaus Grützmacher — Physikalisch-Technische Bundesanstalt, Abbestr. 2-12, D 10587 Berlin

Future optical lithography can reach feature sizes below 100 nm using F₂-laser-radiation at a wavelength of 157 nm. This challenging application requires extremely good quality of laser radiation with respect to its bandwidth and frequency stability. Within the scope of a cooperation with Lambda Physik AG in Göttingen, the radiation of a commercial F₂-laser, type NovaLine F1020, was measured with the high resolving 5 m VUV-spectrometer of PTB Berlin. The aim of this investigation was the spectral characterization of the laser output radiation at 157 nm depending on its operating parameters. The measurement techniques and selected results will be presented.