Berlin 2001 – wissenschaftliches Programm

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Q: Quantenoptik

Q 3: Atom Optics I

Q 3.1: Vortrag

Montag, 2. April 2001, 15:45–16:00, H 104

Atom Lithography with a Holographic Light Mask — •Mario Mützel, Stephan Tandler, Habib Merimeche, and Dieter Meschede — Institute for Applied Physics, Wegelerstr. 8, 53115 Bonn, Germany

During the recent years Atom Lithography with standing wave light masks has successfully been utilized for the production of parallel lines with minimum structure widths of 20 nm. These patterns are a quasi one-dimensional structures. In order to meet demands of nanofabrication, namely the production of more complicated structures, this process has to be expanded by creating two-dimensional standing wave light masks. A very convenient and effective way to produce those light fields is to use holographic mirrors, that deliver complex two-dimensional standing waves from one incident laser beam.

For testing purposes we use a holographic crystal, that diffracts an incoming laser beam into two laser beams, counterpropagating with small angles regarding to the incident beam. The pattern generated with such a light mask is a two dimensional structure, consisting of parallel lines, which are periodically interrupted and displaced.

Our lithography system consists of a self assembled monolayer of nonanthiol on top of a thin gold layer (30 nm). The wetting properties of this monolayer are locally altered by cesium atoms impinging on the surface, such that an aqueous etching solution can remove the underlying gold only in the regions illuminated by cesium atoms.

We present our latest experimental results.