Hamburg 2001 – wissenschaftliches Programm

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DF: Dielektrische Festkörper

DF 7: Ferroelektrische Schichten, Nanostrukturen und Keramiken

DF 7.5: Fachvortrag

Donnerstag, 29. März 2001, 11:30–11:50, S18/19

Passive Optical Devices Structured by Imprint Lithography — •J. Seekamp¹, S. Zankovych¹, C.E. Clavijo Cedeno¹, C.M. Sotomayor Torres¹, G. Böttger², C. Liguda², and M. Eich² — ¹Materialwissenschaften in der Elektrotechnik und Informationstechnik, Bergische Universität GH Wuppertal, D-42097 Wuppertal — ²Materialien der Elektrotechnik und Optik, Technische Universität Hamburg Harburg, D-21071 Hamburg

Nanoimprint lithography (NIL) and passive optical devices based on 2D photonic crystal (PC) structures have received much interest in recent years. In this contribution we present results on nanoimprinted waveguides containing PCs with a gap in the visible. The waveguides were printed into polystyrene (PS) on a SiO₂ substrate and into PVK on a Teflon substrate. The damping of PS/SiO₂ imprinted waveguides is found to be far better than 7 dB/mm. To characterise printed PCs, rib waveguides as well as Y-branches were produced for comparative measurements. 3D FDTD calculations for waveguides consisting of PS on SiO₂ and PVK on Teflon with integrated PCs (square lattice of holes, 20 periods) predict a photonic band gap in the visible. First measurements to verify these predictions will be shown.