Hamburg 2001 – scientific programme
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DS: Dünne Schichten
DS 3: Schichteigenschaften I
DS 3.1: Talk
Monday, March 26, 2001, 11:00–11:15, S 5.1
Magnetic Texturing in Xe-ion irradiated Ni-films — •Kun Zhang1, Klaus-Peter Lieb1, Alexander Müller1, Michael Uhrmacher1, Wolfgang Felsch2, Markus Münzenberg2, and Peter Schaaf1 — 1Universität Göttingen, II. Physikalisches Institut, Bunsenstrasse 7/9, D-37073 Göttingen — 2Universität Göttingen, I. Physikalisches Institut, Bunsenstrasse 9, D-37073 Göttingen
Magnetic anisotropy in thin films may be caused by several mechanisms, such as magnetocrystalline anisotropy, shape anisotropy, magnetostriction, reduced symmetry of the structure or at the interface, and external magnetic fields [1]. Also the high local energy deposition and defect formation via implanted heavy ions can induce changes of the microstructure and the magnetic texture of ferromagnetic films [2,3]. We present experimental results which show the dramatic changes of the magnetic anisotropy in polycrystalline 20-200 nm Ni films deposited on Si(100) and irradiated with 10-900 keV Xe-ions at fluences of 4 × 1014 to 1 × 1016 ions/cm2. The influence of external stresses, magnetic fields, and the substrate temperature will be presented.
[1] B. Heinrich and J. A. C. Bland , Ultrathin Magnetic Structures, New York, 1993
[2] K. Zhang, et al., Nucl. Instr. Meth. B 161 (2000) 1016
[3] M. Neubauer, et al., Nucl. Instr. Meth. B 139 (1998) 332