Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

DS: Dünne Schichten

DS 31: Postersitzung

DS 31.32: Poster

Dienstag, 27. März 2001, 16:30–17:30, Foyer Saal 4

Structural and optical properties of thin lead oxide films produced by reactive DC magnetron sputtering. — •S. Venkataraj^1,2, H. Weis¹, O. Kappertz¹, W. Njoroge¹, R. Jayavel², and M. Wuttig¹ — ¹I. Physikalisches Institut A der RWTH Aachen, 52056 Aachen, Germany — ²Crystal Growth Centre, Anna University, Chennai-600 025, India

In this study, in order to understand reactive DC magnetron sputtering and to study the characteristic properties of lead oxide films, we have deposited different kinds of lead oxide films by varying the oxygen content in the Ar/O₂ mixture, employed to sputter a metallic Pb target. The structure has been determined by X-ray diffraction, which shows that crystalline lead oxide films of different composition (PbO, PbO_1.44, Pb₂O₃ and PbO₂) have been formed upon increasing oxygen flow. The effect of post deposition annealing on the structural properties of PbO films reveals that the film structure is governed by both energetics and kinetics. X-ray reflectivity was used to determine thickness, density and roughness of the films. The calculated film density values are almost equal to the bulk density of the material, showing that compact, nearly void free films are formed. UV-Visible spectroscopy was employed to study the optical properties such as the dielectric function (DF), the optical band gap (E_g) and the refractive index (n) as well as the film thickness.