Hamburg 2001 – scientific programme
Parts | Days | Selection | Search | Downloads | Help
DS: Dünne Schichten
DS 31: Postersitzung
DS 31.43: Poster
Tuesday, March 27, 2001, 16:30–17:30, Foyer Saal 4
Optical properties of polycrystalline MnSi1.7 thin films — •Wolfgang Henrion1, Matthias Rebien1, Heike Angermann1, and Steffen Teichert2 — 1Hahn-Meitner-Institut, Abteilung SE1, Kekulestrasse 5, 12489 Berlin — 2TU Chemnitz, Institut fuer Physik, 09107 Chemnitz
Ex situ spectroscopic ellipsometry as well as near-normal incidence reflectance and transmittance measurements have been carried out on polycrystalline thin films of MnSi1.7 deposited on silicon and on quartz substrates, respectively.To deduce optical constants and film thickness simultaneously, the ellipsometric spectra were analyzed using a three layer model including the native oxide layer of the silicide. The accuracy of the modelling procedure of the ellipsometric data is confirmed by the good correspondence of the reflectance data calculated using the ellipsometric result with the directly measured reflectance spectra. A similar fit procedure has been performed for intensity reflectance and transmittance spectra.The dielectric function has been extracted in the interband spectral region of 0.5 to 4.5 eV. There is good agreement between the results for both methods in the overlapping region of 0.7 to 1.4 eV. Differences in the results for various samples are attributed to the variations in film density and crystalline quality. A value of 0.85 eV has been determined for the lowest direct transition.