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TT: Tiefe Temperaturen
TT 6: Postersitzung I: Josephsonkontakte und SQUIDs, Supraleitung: Theorie, Korrelierte Elektronen, Niederdimensionale Systeme, Magnetotransport, Quantenhalleffekt, Kohlenstoff-Nanoröhrchen, Quantenflüssigkeiten
TT 6.71: Poster
Montag, 26. März 2001, 14:30–17:00, Rang S\ 3
Deposition of carbon nanotubes on chemically modified silicon surfaces — •Ralph Krupke1, Sharali Malik1, Oliver Hampe1, Heiko Weber1, Manfred Kappes2, and Hilbert von Löhneysen3 — 1Forschungszentrum Karlsruhe, Institut für Nanotechnologie, Postfach 3640, 76021 Karlsruhe — 2Universität Karlsruhe, Institut für Physikalische Chemie II, Kaiserstr. 12, 76128 Karlsruhe — 3Forschungszentrum Karlsruhe, Institut für Festkörperphysik und Universität Karlsruhe, Physikalisches Institut, Postfach 3640, 76021 Karlsruhe
We use the difference between wetting of aminoalkyl-terminated- and methyl-terminated silicon surfaces for selective deposition of carbon nanotubes from a dimethylformamide suspension. The method first described by Liu et al.[1] has the potential for highly parallel nanotube self-assembling on prepatterned electrodes. Prior to 3-aminopropyltriethoxysilane (APTES) deposition, trimethylsilyl has to be removed locally by electron beam or AFM lithography. We report on 1) the effectiveness of the electron beam lithography as a function of energy and dose deduced from contact-angle measurements, 2) the impact of sonication of the nanotube suspension on deposition, 3) aging effects in the APTES/chloroform solution.
[1] J. Liu et al., Chem. Phys. Lett. 303 (1999) 125-129