Osnabrück 2002 – scientific programme

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MO: Molekülphysik

MO 12: Photoionisation I (gemeinsam mit FV Atomphysik)

MO 12.8: Talk

Wednesday, March 6, 2002, 18:15–18:30, HS 15/E10

The importance of the non-resonant ionization process of Xenon for the formation of Xe²⁺ after 800 nm short pulse laser interaction. — •R. Wiehle and B. Witzel — Department of Molecular and Optical Physics, Albert-Ludwigs-Universität Freiburg, Hermann-Herder-Strasse 3, 79104 Freiburg

We investigate a laser intensity dependent simultaneous measurement of electrons and ions produced from photo-ionization of Xenon driven by an 800 nm, 100fs laser pulse from a Ti:Sa laser system. The electron spectra are resolved with respect to kinetic energy and ejection angle. The energy and angular electron spectra obtained allow the identification of the electronic states populated during the ionization process and permit a very detailed characterization of the ionization dynamics. Xe²⁺− ions appear at the same laser-intensity when electrons from a non-resonant 9 photon ionization channel are detected. Our proposal is, that a non-resonant ionization process deliver, similarly to an optical tunnelling ionization process, low energy electrons needed for the formation of Xe²⁺ by a backscattering process.The project is supported by SFB 276-C14