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16:30 |
CPP 15.1 |
Distance dependent excited-state relaxation of MePTCDI on semiconductor substrates in the isolated molecule limit — •Eugenio Lunedei, Eugenio Lunedei, Helmut Port, Hans Christoph Wolf, Helmut Port, and Hans Christoph Wolf
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16:30 |
CPP 15.2 |
The effects of divalent ions on DMPA monolayers — •Jens Pittler, Mathias Loesche, and Carsten Selle
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16:30 |
CPP 15.3 |
pH-dependency of the adsorption kinetics of carboxy-terminated alkanethiolate monolayers — •Karin Heister, Michael Himmelhaus, and Michael Grunze
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16:30 |
CPP 15.4 |
Chemische Nanostrukturierung von Oberflächen — •Wolfgang Geyer, Volker Stadler, Alexander Küller, Berthold Völkel, Wolfgang Eck, Armin Gölzhäuser, Michael Grunze, Thomas Weimann und Klaus Edinger
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16:30 |
CPP 15.5 |
Electrochemical Passivation of Gallium Arsenide with Biphenylthiol Monolayers — •Klaus Adlkofer, Wolfgang Eck, Michael Grunze, and Motomu Tanaka
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16:30 |
CPP 15.6 |
Structure and Dynamics of Liquids at Solid Surfaces — •Frank Cichos, Jörg Schuster, and Christian von Borczyskowski
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16:30 |
CPP 15.7 |
Kondensationsmuster von Flüssigkeiten auf benetzungstrukturierten Oberflächen — •Claudia Schäfle, Paul Leiderer und Clemens Bechinger
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16:30 |
CPP 15.8 |
Measurements of the Apparent Line Tension of Hexaethylene Glycol on Silanized Silicon Substrates — •Mika Kohonen, Frieder Mugele, Thomas Becker, Renate Nikopoulos, and Stephan Herminghaus
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16:30 |
CPP 15.9 |
Confined liquids in pores with chemically patterned walls — •Anke Klingner, Thomas Becker, and Frieder Mugele
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16:30 |
CPP 15.10 |
2H NMR investigations of internal dynamics and structures of surfactant layers adsorbed in porous silicas — •Ying Qiao and Monika Schönhoff
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16:30 |
CPP 15.11 |
On the dynamics of surface layer in octylcyanobiphenyl-aerosil nanocomposites — •Stefan Frunza, Ligia Frunza, Harald Goering, and Andreas Schoenhals
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16:30 |
CPP 15.12 |
On the mobility of sodium ions and of confined liquid crystals in faujasite — •L. Frunza, L. Frunza, H. Kosslick, S. Frunza, R. Fricke, A. Schoenhals, H. Kosslick, R. Fricke, and A. Schoenh als
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