Regensburg 2002 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 27: Postersitzung
DS 27.4: Poster
Dienstag, 12. März 2002, 15:30–17:30, Poster Physik B
Ion Beam Erosion of Quartz Glass — •Frank Frost, Dieter Flamm, and Bernd Rauschenbach — Institut für Oberflächenmodifizierung, Permoserstr. 15, D-04318 Leipzig
Atomic force microscopy was used to study the evolution of the surface topography of quartz glass during low-energy Ar+ ion beam sputtering. Depending on the incidence angle of the ion beam different surface topographies emerge. For ion incidence angles less than a critical angle a smoothing of the surfaces is observed. Beyond this critical incidence angle ripple structures with a characteristic wavelength ℓ between 30 and 300 nm are developed. Their wavelength increases with ion energy but it is constant with respect to the ion flux and sample temperature. Under certain conditions the ripple structures are destroyed if the sputter times exceeds a cross over time τ. Regarding the kinetics of surface topography, power law scaling relations for the surface roughness w ∼ tβ and ripple wavelength ℓ ∼ tγ were found. The scaling exponents β and γ as well as the cross over time τ are determined by the ion beam parameters. Additionally, the surface evolution with simultaneous sample rotation was examined. These results are discussed within the framework of existing continuum models for surface erosion by ion sputtering including different relaxation mechanism. As the most important relaxation mechanism for Ar+ ion beam sputtering of quartz glass ion-induced effective surface diffusion was identified.