Regensburg 2002 – scientific programme
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O: Oberflächenphysik
O 22: Adsorption an Oberfl
ächen (II)
O 22.2: Talk
Tuesday, March 12, 2002, 16:30–16:45, H36
Surface distribution of Cu adatoms deduced from work function measurements — •Wolf-Dieter Schneider1, Marina Pivetta1, Francois Patthey1, and Bernard Delley2 — 1Institut de Physique de la Matière Condensée, Université de Lausanne, CH-1015 Lausanne, CH-1015 Suisse — 2Paul Scherrer Institut, CH-5232, Villigen, Switzerland
We report on work function changes due to Cu impurities on one monolayer Xe adsorbed on highly oriented pyrolytic graphite (HOPG), as determined by normal emission ultraviolet photoelectron spectroscopy. Dipole moment and polarizability of a single Cu impurity are deduced from the measurements within the Topping model. The results indicate that Cu atoms adsorb as isolated impurities, a picture which is supported by density functional calculations. This finding confirms an earlier assumption in the scenario for the appearance of a Fano resonance in valence band photoemission spectra.