Regensburg 2002 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

O: Oberflächenphysik

O 26: Postersitzung (Rastersondentechniken, Nanostrukturen, Teilchen und Cluster, Methodisches, Oxide und Isolatoren, Grenzfl
äche fest-flüssig, Struktur und Dynamik reiner Oberfl
ächen, Oberfl
ächenreaktionen, Zeitaufg. Spektroskopie, Phasenüberg
änge

O 26.33: Poster

Mittwoch, 13. März 2002, 14:30–17:30, Bereich C

Molecular Beam Epitaxy with size-selected Nanoclusters: Development of an Electrospray Source — •Frank Stadler, Cheolkyu Kim, Giovanni Costantini, and Klaus Kern — Max-Planck-Institut für Festkörperforschung, D-70569 Stuttgart

The development of a novel cluster source intended for a non-destructive deposition under UHV conditions of monodisperse, colloidally-suspended nanoclusters is described. The challenges associated with the bridging of 13 orders of magnitude in pressure as well as with the guiding, mass-selection and landing of ligand-stabilized nanoclusters are analyzed and the strategies adopted to solve them are discussed. The technological concept of the apparatus, consisting of an electrospray source coupled with an electrostatic ion-optics and a mass-selective velocity filter, will be presented.