Regensburg 2002 – scientific programme
Parts | Days | Selection | Search | Downloads | Help
O: Oberflächenphysik
O 26: Postersitzung (Rastersondentechniken, Nanostrukturen, Teilchen und Cluster, Methodisches, Oxide und Isolatoren, Grenzfl
äche fest-flüssig, Struktur und Dynamik reiner Oberfl
ächen, Oberfl
ächenreaktionen, Zeitaufg. Spektroskopie, Phasenüberg
änge
O 26.65: Poster
Wednesday, March 13, 2002, 14:30–17:30, Bereich C
Surface reactions on the molecular level - A STM study of chemical decoration processes at the substrate-solution interface — •Stephanie Hoeppener1,2, Lifeng Chi1, Gerhard Erker3, and Harald Fuchs1 — 1Physikalisches Institut, Westfälische Wilhelms-Universität, Wilhelm-Klemm Str. 10, 48149 Münster, Germany — 2Dept. of Materials & Interfaces, Weizmann Institute of Science, 76100 Rehovot, Israel, Tel.: +972-8-9342268, Fax: +972-8-9344138, e-mail: stephanie.hoppener@weizmann.ac.il — 3Organisch Chemisches Institut, Westfälische Wilhelms-Universität, Corrensstr. 40, 48149 Münster, Germany
Surface mediated chemical reactions are of interest for a large number of applications. The key to designing new, more effective or more resistive materials is to understand which kind of parameters affect the surfaces reactivity. Additionally, with upcoming efforts in the field of nanotechnology the advantages of special laterally designed nanostructures that might influence the reactions efficiency are widely discussed. Here we present an approach that utilises the chemical decoration of perfectly arranged self-organised molecular templates to establish position sensitive decoration of functional groups on the molecular scale. This decoration process can be directly investigated at the substrate-solution interface of HOPG by means of STM. Besides the possibility to arrange linear assemblies on the molecular level and to indirectly detect molecular orientations this technique provides especially interesting insights into the dependence of chemical reactions on the molecular geometry of the template structure.