Regensburg 2002 – wissenschaftliches Programm

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SYME: Mechanical Properties of Thin Films

SYME 2: Nanoindentation

SYME 2.6: Vortrag

Dienstag, 12. März 2002, 10:45–11:00, H 4

Mechanical Properties of Al-Based Amorphous and Microcrystalline Thin Films — •Hans-Jörg Fecht, Lothar Berger, Joachim Mrosk, and Christoph Ettl — Center for Mircromaterials, Ulm University, Albert-Einstein-Allee 47, D-89081 Ulm

Amorphous metal alloys are ideally suited as advanced materials in micro-electromechanical systems (MEMS) because of their resistance against stress- and electromigration and their stability in chemically aggressive environments. While amorphous refractory metal alloys and amorphous silicides are excellent interconnect materials for devices operating at elevated temperatures, these systems lack the cost-effective and easy interconnect processing of the prevalent polycrystalline aluminum alloy metallizations. Amorphous aluminum alloys are applicable to devices operating at up to 200C, and their stress migration resistance and chemical stability is far superior to conventional polycrystalline aluminum alloys. These metallizations are especially suited for surface acoustic wave (SAW) devices, where the interconnects are exposed to considerable mechanical strains. In this work amorphous Al-Y alloy thin film metallizations deposited on appropriate substrates at room temperature by ultra-high vacuum (UHV) electron beam evaporation will be presented. Their mechanical and electronic properties together with their temperature stability will be discussed.