Regensburg 2002 – wissenschaftliches Programm

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SYPF: Struktur und Dynamik in dünnen Polymerfilmen

SYPF 2: Poster Session

SYPF 2.9: Poster

Donnerstag, 14. März 2002, 09:00–18:00, Poster B

An Universal Mechanism for Hole Formation in Solvent Cast Polymer Films — •Daniel Podzimek, Stephan Herminghaus, and Karin Jacobs — Abt. Angewandte Physik, Uni Ulm, Albert-Einstein-Allee 11, 89069 Ulm

It is shown that the intrinsic stress in solvent cast polymer coatings plays a key role in the nucleation of holes in the film. Nucleation is important because it is meanwhile clear that heterogeneous nucleation is the only relevant rupture mechanism for the technologically relevant thickness regime well above 100 nm. The most striking feature is that in contrast to what has been widely believed, the number density of holes does not scale algebraically, but exponentially with the film thickness.