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VA: Vakuumphysik und Vakuumtechnik

VA 1: Vakuumverfahrenstechnik

VA 1.4: Vortrag

Montag, 11. März 2002, 11:10–11:30, H47

Plasma Diagnostics by Quadrupole Mass Spectrometers — •Guenter Peter, Norbert Mueller, and Hans Zogg — Inficon AG, LI- 9496 Balzers, Liechtenstein

Once a plasma deposition or cleaning process has been successfully developed a minimum of sensors such as flow meters and pressure gauges and / or electrical probes are required to keep the process reproducible.

In the field of process development the chemistry going on in the plasma is of vital importance. Here the species , molecules, ions and their energy distribution have to be determined in order to optimise such a process. For this purpose a combination of energy filter and mass filter is required.

Today s plasma processes differ in the gas composition, the pressure range and the geometry. Therefore the instruments have to be adapted to the individual application.

Based on standard components (mass filters, electrostatic energy filters detectors) various instruments were designed.

These instruments differ in energy resolution, acceptance angle, process pressure range and admissible magnetic field. For special applications accessories such as a water cooled RF-powered wafer chuck in which the mass spectrometer is incorporated, were designed.

An overview about the different instruments and accessories will be given.