Aachen PK 2003 – scientific programme

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K: Kurzzeitphysik

K 2: Pulsed power technology

K 2.4: Talk

Wednesday, March 19, 2003, 12:15–12:30, F04

Nanoscale applications with laboratory size XUV sources — •Juri Barthel, Konstantin Walter, Klaus Bergmann, and Willi Neff — Fraunhofer ILT, Steinbachstr. 15, 52074 Aachen

Radiation of the spectral range from 1 to 50 nm (XUV) has the potential to explore new fields of application for nano-analysis. This necessitates the tuning of radiation sources and optical components, in order to obtain at-wavelength solutions with application specific characteristics. The capability of XUV-light from laboratory scale plasma sources as being a measuring tool for different kind of analysis purpose is tested experimentally. Results of the experiments examining thin films in transmission and surface in reflection will be presented and discussed.
The XUV range containes K-shell and L-shell absorption edges of most elements. The shift of the absorption edges and the characteristic energy of emitted photoelectrons deliver information about the chemical consistency of the specimen. The thickness of thin foils can be measured in transmission due to high absorption coefficients.
Grazing incidence reflections are applicable to detect the thickness of thin layers and surface roughness (RMS in the range of wavelength). In combination with spatial resolution the analysis of surface topography is possible.