Aachen PK 2003 – scientific programme
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P: Plasmaphysik
P 10: Poster II
P 10.26: Poster
Tuesday, March 18, 2003, 17:30–19:15, Foyer
Spectroscopic Diagnostics of Dielectric Barrier Discharge (DBD) in Ar/CxFy mixtures — •Igor Vinogradov, Mahmud Shakhatre, and Achim Lunk — Institut für Plasmaforschung, Universität Stuttgart, Pfaffenwaldring 31, 70569 Stuttgart, Germany
Gas discharge diagnostics: FTIR- and UV- absorption as well as UV/VIS- emission spectroscopy were applied to get information on the absolute density of CF2: and the reaction products in a DBD running in Ar/fluorocarbon mixtures at a pressure of one bar. The following fluorocarbon molecules have been studied: CF4, C2F6, C2H2F4, C3HF7, C3F8, and c−C4F8. From all mention diagnostics tools almost all stable products and important radicals were identified depending on gas mixture, admixture small amount of N2, or H2, or O2 molecules, and average energy introduced into DBD in Ar/fluorocarbon mixtures. But CF- radicals and F atom production were not found by emission either by absorption spectroscopy. The dependencies of CF2:- and CF3- production efficiency in DBD on polymer film deposition rate with F/C ratio as parameter was studied. Fluor to carbon atom ratio (F/C) in precursor molecule was found to be as one of the most important key parameter. By F/C ratio smaller as 2.5 the plasma polymerisation was dominated. If F/C ratio larger than 2.5 the plasma etching was the main process in DBD. But in the last case by small admixture of H2 molecules to DBD in Ar/CxFy mixture the plasma polymerisation was occur.