Aachen PK 2003 – wissenschaftliches Programm

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P: Plasmaphysik

P 10: Poster II

P 10.30: Poster

Dienstag, 18. März 2003, 17:30–19:15, Foyer

Measurements of the Parallel and Perpendicular Flow in the Electrode Biased Plasma Edge of Textor-94 using an Improved Theoretical Model — •Peter Peleman¹, Guido Van Oost¹, Stefan Jachmich², and Michael Van Schoor² — ¹RUG, Ghent University-Department of Applied Physics, B-9000 Ghent, Belgium — ²Laboratory for plasma physics, Ecole Royale Militaire/Koninklijke Militaire School, B-1000 Brussels, Belgium

On Textor-94 it has been observed that in improved confinement high electric fields and plasma flow exist. Theoretical and experimental work has shown that the shear in the plasma flow is responsible for suppression of the particle transport. Mach probes are suitable instruments to measure the profiles of parallel and perpendicular plasma flow. We have improved the model of Van Goubergen which we use to redo the analyses of the probe data. Starting from the up- and downstream current, measured with a Mach probe with 2 facing collectors, we obtain the electric field, density and electron temperature profiles in electrode biasing discharges. For an independent comparison we included the Li-beam density and He-beam temperature profiles. Furthermore we are capable to investigate the flow in this region using perpendicular and parallel Mach number profiles. A Mach number is defined as the ratio of the velocity of the ions and ion sound speed which is depending on the electron and ion temperature. It will be shown that in improved confinement (electrode biasing) a higher electric field appears which generates the parallel and perpendicular flow.