Aachen PK 2003 – scientific programme
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P: Plasmaphysik
P 10: Poster II
P 10.47: Poster
Tuesday, March 18, 2003, 17:30–19:15, Foyer
Deposition and characterization of polymerlike and hard a-C:H films — •Janine-Christina Schauer, Suk-Ho Hong, Johannes Berndt, and Jörg Winter — Institut für Experimentalphysik II, Ruhr-Universität Bochum, 44780 Bochum
We have studied properties of a-C:H films deposited in pure C2H2 or CH4 plasmas. The films were deposited in a standard GEC cell on Si-wafers. The 13.56MHz RF power is coupled capacitively to the showerhead type upper electrode or lower electrode. This results in deposition of two types of films (soft and hard). The net input power is about 20 Watt. Typical deposition time is about 15 minutes and the net gas flow is 2 sccm for both gases. The properties of the films such as thickness and optical constants are characterized by means of ex-situ ellipsometry, and the surface topology is studied by AFM. The carbon contents in the films are investigated by means of Rutherford backscattering and scales (1micro-gram precision) and the results are compared. The chemical components of the films are determined by means of FTIR. The porosity of the films is measured by a positron scanning microscope.