Aachen PK 2003 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

P: Plasmaphysik

P 10: Poster II

P 10.6: Poster

Tuesday, March 18, 2003, 17:30–19:15, Foyer

The influence of a blocking electrode and fast charging on the working pressure of a Pseudospark discharge in Xenon — •Rainer Bischoff — Universität Erlangen-Nürnberg, Physikalisches Institut I, Erwin-Rommel-Strasse 1, 91058 Erlangen

The pseudospark is a gas discharge in a hollow-electrode geometry working at low pressures on the left-hand branch side of the Paschen curve. Besides its remarkable properties for high voltage and high current switching applications, recently the pseudospark discharge gained considerable interest to be used as source for extreme ultraviolet lithography (EUVL). However an increase of the working pressure is required providing the needed EUV-radiation at the projected wavelength of 13.6 nm (Xenon as working gas).

A shift of the Paschen curve towards higher pressures can be obtained by applying a blocking electrode in the sphere behind the hollow-cathode or by fast charging of the capacitor bank connected to the Pseudospark switch.

The results of the measurements performed under variation of the position and geometry of the blocking electrode, the applied blocking voltage and the velocity of high-voltage charging are presented.