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P: Plasmaphysik

P 15: Low Temperature Plasmas, Plasma Technology

P 15.2: Vortrag

Donnerstag, 20. März 2003, 15:50–16:10, FO1

Characterisation of a cascaded discharge setup by UV-VIS-spectroscopy — •Michael Heise¹, Oliver Franken², Thomas Lierfeld², and Willi Neff¹ — ¹Fraunhofer Institut Lasertechnik, Aachen, Germany — ²Lehrstuhl f"ur Lasertechnik, RWTH Aachen, Aachen, Germany

Plasmas, especially dielectric barrier discharges, emit characteristic spectra of visi-ble and ultraviolet light whereas the spectral composition is determined mainly by the discharge gas, for example nitrogen or argon. The emitted spectral power density of the discharge in the UV range is dependent on power input and on the type of setup itself. In a suitable arrangement of two discharge gaps the UV emission of the first discharge can lead to an increased UV conversion efficiency in the second discharge. This will be demonstrated through results of measure-ments of power input via Lissajou method in conjunction with UV-VIS-spectroscopy.