Aachen PK 2003 – wissenschaftliches Programm

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P: Plasmaphysik

P 17: Poster III

P 17.13: Poster

Donnerstag, 20. März 2003, 17:30–19:15, Foyer

Interaction of Plasma Flow and Glow Discharge in Technological System with Crossed E and B fields for Ion Beam Assisted Deposition — •Igor Levchenko¹, Maxim Romanov¹, Oleg Baranov¹, and Michael Keidar ² — ¹Kharkov National Aerospace University, Kharkov, Ukraine — ²Department of Aerospace Engineering, University of Michigan, Ann Arbor, MI 48109, USA

The ion beam assisted deposition consists in film application and bombardment with ions having energy exceeding the mean energy of ion flow used for deposition. We used a combination of vacuum arc guns and axial system with magnetic coils. The system consists of a vacuum chamber, vacuum arc guns, cylindrical substrate, and magnetic unit which creates steady axially symmetric magnetic field. With substrate biased, the crossed system of radial electrical field and longitudinal magnetic field is created, providing electron drift around cylindrical substrate. This scheme ensures magnetic confinement of electrons around the target. The similar scheme is used in Hall thrusters. The plasma structure in this system consists of a bright ionization tore around the target and the complex sheath specified by the magnetic field shape. The ion current distribution showed a significant maximum with a width of 30 mm approx. and reaching a value of 500 A per square meter. Two additional current peaks are found in the areas where intense ionization occurs. The magnetic field in this system can be effectively used for controlling a current maximum.