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P: Plasmaphysik
P 17: Poster III
P 17.36: Poster
Thursday, March 20, 2003, 17:30–19:15, Foyer
On the Coating of Powder Particles in a Magnetron Discharge — •G. Thieme, M. Fröhlich, D. Bojic, A. Kopytov, H. Kersten, and R. Hippler — E.-M.-Arndt-Universität, Institut für Physik, D-17487 Greifswald
Thin metallic films (Al, Ti, Cu) were deposited by means of DC-magnetron-sputtering on silicon oxide particles (∼18µm) suspended in an Argon-RF-discharge (5Pa, 5W). The coated particles were examined by electron microscopy (SEM). Depending on the target material the structure of the metallic films was different. While the Al- and Cu-films were deposited rather smoothly, the Ti-films showed a distinct island formation.
During these experiments an interesting observation was made: when the magnetron was turned on the entire particle cloud began to rotate. After the magetron was turned off the rotation ceased fast due to neutral drag. This particle motion was studied in dependence of various parameters like pressure and magnetron power. The rotation is believed to be caused by collision of ions with the particles.