Dresden 2003 – scientific programme

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DS: Dünne Schichten

DS 12: Schichtwachstum II

DS 12.4: Talk

Wednesday, March 26, 2003, 16:00–16:15, GER/37

Modeling the Chemistry of Plasma Polymerization using Mass Spectrometry Data — •Dieter F. Ihrig, Oliver Winkelhake und Oliver Streuber — FH Suedwestfalen, Iserlohn, Germany

The environmental technologies laboratory is developing processes of plasma etching and polymerization. Polymerized thin films are first order corrosion protection and primer for painting. Using pure acetylene we get very nice thin films which nevertheless were not bonded very well. But using air as bulk gas it is possible to polymerize well bonded thin films. Nitrogen is necessary to generate them. UV/Vis spectroscopy shows nitrogen oxide radicals in emission spectra of pure nitrogen and air. But nitrogen oxide is fully suppressed in presence of acetylene. IR spectroscopy shows only C=O, CH2 and CH3 groups but no nitrogen species. With the aid of UV/Vis spectra and the chemistry of ozone formation it is possible to define reactive traps and steps. Using a numerical model it is possible to calculate theoretical mass spectra. The adjustment of theoretical mass spectra to real measurements leads to a quantification of the chemistry. A strategy to trim the model is shown.