Dresden 2003 – scientific programme

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DS: Dünne Schichten

DS 12: Schichtwachstum II

DS 12.5: Talk

Wednesday, March 26, 2003, 16:15–16:30, GER/37

Atomistic computer simulations on growth and annealing processes of CoCu multilayers — •Michael Müller and Karsten Albe — TU Darmstadt, Fachbereich Material- und Geowissenschaften, Petersenstr. 23, 64287 Darmstadt

The Giant Magneto Resistance of multilayers consisting of alternating ferromagnetic and para-/diamagnetic layers strongly varies with the interface quality (e.g. roughness, intermixing). The ability to control the interface quality depends on the knowledge of atomic scale mechanisms active during film growth or subsequent annealing steps. Here we present atomic scale computer simulation studies on growth and annealing of CoCu multilayers. By means of Molecular Dynamics simulations we have identified diffusion mechanisms of surface atoms and vacancies and calculated their corresponding activation energies. Based on these results Kinetic Monte-Carlo simulations were performed that allow to simulate experimental time scales. Using this method we have investigated layer growth and annealing of interfaces with varying roughnesses at different temperatures.