Dresden 2003 – scientific programme
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DS: Dünne Schichten
DS 13: Strukturbildung
DS 13.6: Talk
Wednesday, March 26, 2003, 18:00–18:15, GER/37
Evolution of microstructure and preferred orientation in TiAlN thin films – an in-situ study by synchrotron x-ray scattering — •Manfred Beckers1, Norbert Schell1,2, and Wolfhard Möller1 — 1Institute of Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, Dresden, Germany — 2ROBL-CRG at ESRF, Grenoble, France
Metal nitrides are widely used as diffusion barriers or wear-resistant coatings. Of crucial importance – but still little understood – is the development of preferred orientation exerting tremendous influence on mechanical properties. Hence a small deposition chamber has been developed and mounted on the goniometer of the ROBL-CRG beamline at ESRF, which allows in-situ x-ray diffraction and reflectivity measurements as a function of film thickness [1]. In the consequence, the texture development of Ti1−xAlxN films has been studied, which show the typical (002) and (111) competitive growth. All films have been grown on oxidized silicon by simultaneous reactive magnetron sputter deposition from metallic Ti and Al targets in an Ar-N discharge. Both bias voltage, substrate temperature and elementary composition have been varied in order to compare the texture evolution with models in the literature [2].
[1] W. Matz, N. Schell, J. Bøttiger et al., Rev. Sci. Instr. 72, 3344 (2001)
[2] F. Adibi, I. Petrov, J. E. Greene, L. Hultman and J.-E. Sundgren, J. Appl. Phys. 73, 8580 (1993)