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DS: Dünne Schichten

DS 18: Ionenstrahlverfahren I – Schichtherstellung und Schichtwachstum

DS 18.7: Vortrag

Donnerstag, 27. März 2003, 16:45–17:00, GER/37

Formation of ordered nanoscale dots by ion sputtering - Role of the angle of ion incidence — •Bashkim Ziberi, Frank Frost, Thomas Höche, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung e. V., Permoserstrasse 15, D-04318 Leipzig, Germany

The formation of periodic ripple structures on surfaces bombarded with ions under oblique (off-normal) incidence is a well-known and intensely studied phenomenon. In contrast to these long standing investigations, a new self-organization phenomenon was noticed for ion sputtering under oblique ion incidence with simultaneous sample rotation. Due to the rotation induced abolishment of the anisotropy in the evolution of the surface topography, naturally given by the direction of the ion incidence, the formation of nanometer-sized islands can be observed. For prolonged sputtering these island or dot structures are characterized by relatively uniform size distribution and a striking large degree of spatial ordering.

This contribution focus on the specific role of the angle of ion incidence on the geometrical shape and the spatial arrangement of the arising nanostructures. New experimental results for dot formation on InP, GaSb, InSb and InAs surfaces will be presented.