Dresden 2003 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 2: FV-internes Symposium „Dünnschichtanalytik“ II

DS 2.1: Hauptvortrag

Montag, 24. März 2003, 14:30–15:10, GER/37

New Developments and Aplications in Electron Beam Analysis of Thin Films — •Michael Kopnarski — Institut fuer Oberflaechen und Schichtanalytik Universitaet Kaiserslautern Erwin Schroedingerstr. Geb 56 67663 Kaiserslautern

This contribution surveys electron beam techniques and their applications in the compositional and structural characterization of thin films. Apart from discussing specific examples of such analyses, current instrumental developments and concepts, such as work function spectroscopy (WFS) are outlined. Analytical investigations using Photo- and Augerelectron Spectroscopy (PES, AES), Electron Energy Loss Spectroscopy (EELS), Electron Microscopy (TEM, SEM) and others are elucidated in the areas of failure analysis, chemical thin film and surface analysis of glass coatings, plasma treated polymers or chemical surface reactions.