Dresden 2003 – scientific programme
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DS: Dünne Schichten
DS 24: Poster
DS 24.18: Poster
Tuesday, March 25, 2003, 14:30–17:00, P2a
Growth and structural properties of ZnO thin films on Al2O3 and Au on ZnO — •Murat Ay, Alexei Nefedov, and Hartmut Zabel — Institut für Experimentalphysik IV Ruhr-Universität Bochum 44780 Bochum Germany
ZnO films have been grown on Al2O3 substrates by RF sputtering from an ZnO target using 5x10−3 mbar of pure Ar as sputter gas. The temperature during growth was varied between room temperature and 500∘C. After the growth the films were annealed in order to increase the film quality. The annealing was performed in an oxygen atmosphere with a partial pressure of 1000 mbar and in a UHV chamber with the possibility to monitor in-situ the structural quality by RHEED and mass spectrometry. The ZnO/Al2O3 samples were investigated by x-ray scattering and atomic force microscopy. The thickness and roughness of the samples have been studied by x-ray reflectivity and AFM, while the crystalline structure has been determined by high angle x-ray diffraction. The x-ray measurements were performed at the beamline W1.1 at HASYLAB and with the rotation anode generator in Bochum. The optimized ZnO films were epitaxial and had a mosaicity of 0.60∘ with a surface roughness of less than 3 Å. Subsequently, the ZnO/Al2O3 substates with the best quality were used for Au deposition by DC and RF sputtering at different temperatures.