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DS: Dünne Schichten

DS 24: Poster

DS 24.21: Poster

Dienstag, 25. März 2003, 14:30–17:00, P2a

Investigation of the correlation between stress and nucleation at the deposition of hard carbon thin films — •Nicolas Wöhrl, Stephan Reuter, and Volker Buck — AG Dünnschichttechnologie, FB7 Techn. Physik, Universität Essen, Universitätsstr. 3-5, 45141 Essen, Deutschland

In this work the influence of the nucleation and nucleation density on the intrinsic stress of hard carbon films are investigated. Different CVD deposition methods are compared. Diamond films are deposited by hot filament CVD, inductively coupled microwave plasma CVD and by dc-arc plasma CVD. The deposited films are analysed by FTIR, Scanning Micro Raman, XRD and SEM measurements. The overall stress on the substrate is measured by an optical setup, measuring the substrate curvature. The development of the intrinsic stress over different deposition times is monitored. Information about the stress in the diamond grains is gained by the line shift of the 1332 cm-1 Raman diamond line. The structure of the films is analysed by SEM as well as AFM and correlated to the spectroscopic measurements. The quality of the films is analysed by the Raman spectra. The correlation of the quality of the diamond films to the stress and the nucleation density is investigated.