Dresden 2003 – scientific programme

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DS: Dünne Schichten

DS 24: Poster

DS 24.23: Poster

Tuesday, March 25, 2003, 14:30–17:00, P2a

Structural and optical characterisation of quartz-deposited amorphous SiC:H- thin films grown by precursor pyrolysis. — •O. Sciurova¹, J.R. Niklas¹, A. Hilbig², E. Müller², R. Wenzel³, K. Trommer³, and G. Roewer³ — ¹Institute of Experimental Physics, University Bergakademie Freiberg, Germany — ²Institute of Ceramic Materials, University Bergakademie Freiberg, Germany — ³Institute of Inorganic Chemistry, University Bergakademie Freiberg, Germany

Thin layers of amorphous SiC:H were quartz-deposited by pyrolysis of a synthesised low-viscosity polymer, an oligomer (chlorovinylsilane). To obtain homogenous layers with a thickness smaller than 1 mkm the oligomers were diluted in CH₂Cl₂ or in toluene. The characteristics of the composition and structure of amorphous SiC-layers were examined by FTIR, XPS, WDS and EDS measurements. A hydrogen-stabilisation of the amorphous structure of the films is suggested. Optical absorption measurements showed significant variation in Eopt within the sample range, from 1.6 eV up to about 2.2 eV. From EPR measurements of pyrolysis amorphous SiC quartz-deposited films the spin-density (density of dangling bonds) was estimated to equal 10¹⁹ - 10²⁰ spin/cm³, which corresponds to the value for conventionally deposited amorphous SiC films.