Dresden 2003 – scientific programme

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DS: Dünne Schichten

DS 24: Poster

DS 24.3: Poster

Tuesday, March 25, 2003, 14:30–17:00, P2a

Thermionic Vacuum Arc,a new type of discharge for deposition of nanostructured carbon films — •Cristian Cudalbu, Geavit Musa, and Ion Mustata — National Institute for Lasers,Plasma and Radiation Physics,P.O.Box MG-36,76900,Bucharest,Romania

We report a new technology developed in our laboratory namely Thermionic Vacuum Arc discharge (TVA). Thermionic Vacuum Arc consists of a heated cathode surrounded by a whenelt cylinder that concentrates high voltage accelerated electrons on the anode material . Continuous evaporation of the material from the anode ensures enough steady state carbon vapour density in the interelectrodic space to ignite (due to the applied high voltage) and to maintain a bright discharge in carbon vapour. High resolution TEM images show the graphitization tendency of the deposited film on the extended domains. In conclusion we have shown that using TVA technology in the specified conditions we can deposit carbon films with a very clear graphitization tendency.