Dresden 2003 – wissenschaftliches Programm

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DS: Dünne Schichten

DS 9: Laserverfahren zur Schichtherstellung und Oberfl
ächenmodifizierung I

DS 9.1: Hauptvortrag

Dienstag, 25. März 2003, 09:30–10:15, GER/37

Pulsed laser deposition (PLD) - a versatile thin film technique — •Hans-Ulrich Krebs — Institut fuer Materialphysik, Universitaet Goettingen, 37073 Goettingen

Since pulsed laser deposition (PLD) was first successfully applied for the preparation of epitaxially grown stoichiometric thin HTSC films with high critical currents, it nowadays became a versatile technique also for the preparation of all kinds of other materials. With this technique, for instance oxides, nitrides or carbides, ceramics, metals and even polymers or fullerenes can be prepared. In this talk, the ablation and deposition processes are presented, the influence of the preparation conditions on the film properties - with main aspect on the influence of the particle energy during deposition of metal systems -, and the applicability of PLD for the preparation of complex materials like polymer/metal and ceramic/metal compounds and multilayers are discussed.